Methods of preparing, imaging and printing thermally switchable resist containing poly(betaine)

This study explored an area of photolithography involved in on-press developable (switchable) plate formation for the graphic arts industry. Historically, the process for forming a lithographic plate required a dissolution step in an alkaline and/or other chemical developer. In view of global environmental protection and green chemistry initiatives, the disposal of the developer waste has been a matter of industrial concern. Thus, there are increased demands for improvements to either wet processing or even no processing. The research discussed in this study is intended to develop a method for direct formulation of a photoresist using a light sensitive organic polymer with switchable composition having the capability to change its nature from hydrophilic to hydrophobic property upon radiation.;The photoresist is coated thinly onto a substrate (aluminum) to produce a hydrophilic surface. The polarity change of a negative working photoresist is observed on-press (reproduction to paper) with radiated areas having ink receptive properties (hydrophobic) and non-imaged areas having water accepting properties (hydrophilic). (Abstract shortened by UMI.).