Preparation Of Ti?N Doped Nano-diamond Film And Study On TiV Color Center

Nano-diamond film is a new type of material with broad application prospects.It has excellent physical and chemical properties at the same time and is used in different fields.The diamond color center has shown great practical application value in the field of quantum communication and quantum computing,and is a hot research topic.In particular,the diamond color center has the advantages of narrow bandwidth,short fluorescence lifetime and good chemical stability,and serves as a single photon source.It has a wide range of applications in quantum computing,quantum cryptography and other fields.At present,the diamond color centers that can be combined with practical applications are lacking in different properties.For example,the Si V color center has a long excited state life and cannot effectively reflect the spin state of the quantum.In recent years,the color center formed by transition metal doped diamond has received extensive attention from researchers.The transition metal element 3d orbital electrons have different arrangements,and the combination with diamond produces excellent luminescence properties.Therefore,finding new transition metal-related color centers with excellent properties is the focus of current research.This paper studies the effects of doping titanium,nitrogen and co-doping of the two on the microstructure of the film during the deposition of nano-diamond using microwave plasma chemical vapor deposition(MPCVD)equipment.Experimental research on deposition parameters such as different carbon source concentrations and substrate temperature.Experiments compared the effects of different deposition parameters on the microstructure of nano-diamond films.The analysis found that reducing the deposition temperature within a certain range can increase the secondary nucleation rate during the deposition process.,The diamond grains in the prepared samples are smaller.With the gradual increase of the CH₄ concentration,the deposition rate increases,and at the same time,more amorphous carbon or graphite and other impurities are formed,which reduces the quality of the film.However,an excessively high concentration of carbon source will cause a decrease in the deposition rate of the film.This paper proposes and uses two methods for the preparation of titanium color center(TiV)films.The first is to use magnetron sputtering assisted MPCVD for experimental preparation of diamond TiV color centers.The second is to use titanium powder and nano-diamond particles mixed crystal seeding solution for experimental preparation of TiV color centers.Through X-ray photoelectron spectroscopy detection and analysis,it was found that the Ti2p peak appeared in the samples assisted by magnetron sputtering,indicating that the magnetron sputtered titanium on the surface of the quartz substrate can be introduced into the nanodiamond film deposited by MPCVD.The PL of the sample was detected by a laser confocal Raman spectrometer,and two peaks of TiV0 at 537nm and761nm were observed.At the same time,the effect of N₂ on the titanium-doped nanodiamond film was studied,and it was found that N₂ is beneficial to the combination of titanium and carbon.In the second method,the Ti2p peak detected by XPS is weak,and the fluorescence spectrum analysis found that there are obvious luminescence peaks near440nm and 500nm,which may be caused by the N3 and OK1 luminescence centers corresponding to Ti-N⁰ and TiV-N⁰ in diamond.of.