Key Technology Of Tomography Mueller Matrix Scattering Measurement And Software Development Of Instrument System

In recent years,with the development of nano-manufacturing technology,the size of the chip has become smaller and smaller,and the integration has become higher and higher.It has reached the nano-level manufacturing process,and has put forward higher and higher requirements for measurement technology.For the ellipsometry technology,due to its advantages of high precision,no contact,no damage,etc.,it is currently more and more widely used in many fields such as semiconductor,biology,medicine,photovoltaic industry and so on.With the extension of the application of ellipsometry,traditional ellipsometry can only collect zero-order diffracted light and can only measure simple periodic structures,which is not suitable for measuring complex nanostructures.This article focuses on the tomography Muller matrix scatterometer.This instrument combines the ability of Muller matrix measurement with high-resolution microscopic imaging technology.It can measure multiple angles of incidence based on high-NA objective lenses,which can obtain more comprehensive information of the sample.This article will focus on the exploration of instrument optimization design,instrument calibration,system software design and other aspects.The specific research content and innovations are as follows :(1)The instrument measurement principle of the tomographic Muller matrix scatterometer is elaborated,the system model of instrument polarization measurement is deduced,the principle of instrument high-resolution tomography is introduced,and the parameter extraction process is introduced in conjunction with the data processing method.(2)Aiming at the speckle phenomenon and Gaussian distribution of laser as an imaging illumination source,an optical illumination system was designed to achieve uniform and collimated illumination beams,and the effectiveness of the system was verified through experiments.(3)The error sources in the instrument’s polarization measurement system are analyzed,and a system calibration algorithm based on non-linear fitting is proposed to achieve in-situ calibration of all calibration parameters and improve the measurement accuracy of the instrument;An autofocus algorithm is designed to improve instrument automation Measurement capability;An edge recognition algorithm is designed,which can have a good discrimination effect for weak two-dimensional materials.(4)In response to the measurement needs of the tomography mueller matrix scatterometer,the instrument system software was developed based on Lab VIEW,and each functional module of the system software was written,and the functional tests of each module and the overall software were conducted.Application tests were conducted to verify that the design of the system software meets the measurement needs of the tomography matrix scatterometer.