| The nanostructure anti-reflection film can be widely used in the photovoltaic field,because it can effectively reduce the reflectivity of the photovoltaic device,increase the light absorption rate,which greatly improve the solar energy utilization rate of the photovoltaic device.Among them,nanoimprint technology,as a promising nanostructure preparation technology,is used to prepare large-area nanostructure antireflection films.However,due to the particularity of the nanoimprint technology processing,it is easy to cause damage to the nanostructure during the processing.In order to prepare a large-area nanostructure anti-reflection film,and to ensure the shape,size and filling rate of the nanostructure,this paper proposes a new type vibration-assisted nanoimprint technology.Through the introduction of low-frequency and low-amplitude one-dimensional lateral vibration under the photoresist during the imprinting process,the filling rate of the photoresist and the surface uniformity of the nanostructure anti-reflection film are improved.The study can be summarized as follows:(1)The working principle of vibration-assisted nanoimprinting technology is explained,and the vibration-assisted nanoimprinting devices is designed and worked out.To demonstrate the rationality of vibration-assisted nanoimprinting technology theoretically,the mathematical model of filling rate of photoresist under vibration is established.In addition,according to the theoretical requirements of the vibration-assisted nanoimprint technology,a matching vibration-assisted platform is designed and developed.In order to ensure that the device can accurately transmit low-frequency and low-amplitude lateral vibration,the magnification ratio of the vibrating platform is calculated.At the same time,in order to prevent material failure of the vibrating platform during processing,the modal and stress analysis of vibration-assisted platfoem is simulated by the Ansys Workbench software.(2)To optimize the parameters of nanostructure layer,the relationship between the geometric paramters of different nanostructures and the filling effect is studied by using the optical analysis software.Meanwhile,the working principe of the nanostructure anti-reflection film is dicussed base on the theory of reflection.The finite time method is established to analyse the influence of different kinds nanostructure layers(shape、aspect ratio、arrangement)on the reflection efficiency of surface.The optimal nanostructure morphology after the simulation will be used as the main parameters of the vibration-assisted nanoimprinting experiment.(3)The basic principles of contacting during the process of vibration-assisted nanoimprinting.To reveal the actual effect of vibration after adding vibration during the process of imprinting,the mechanical properties and deformation laws of the photoresist is studied based on the macro-mechanical theory and rheological theory.Meanwhile,from the perspective of kinematics,numerical analysis of mechanics and deformation of the imprinting process is carried out to study the rationality of vibration imprinting.The finite element analysis(FEA)method is uesd to study the influence of the main performance of the vibration device(including vibration amplitude and vibration frequency)on the filling effect,analyze the influence of vibration amplitude and vibration frequency on the surface quality and dimensional accuracy of the nanotructure layer,thereby Clarify the optimal vibration working range of the experiment.(4)According to the requirements of nanoimprinting experiments and the best parameters(geometric parameters and vibration parameters)obtained by simulation,performing the vibation-assisted nanoimprinting experiment.The rationality of vibration-assisted nanoimprint technology is demonstrated from an experimental point of view by contrast.Then,the nanostructure dimensional accuracy and surface properties will be tested by correlating measuring instrument after the experiment. |
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