Film Evaporation Simulation, Equipment Design And Application For The 2-(Butyl-nitro-amino) Ethyl Nitrate Evaporation Process

The 2-(butyl-nitro-amino) ethyl nitrate (BuNENA BuNENA) is a kind of majority specific volume, low detonation temperature, nonvolatile and other excellent performance of the energetic plasticizer, which is widely used in various propellant formulations. Therefore it was required a high purity. However, there are many shortcomings in the conventional post-processing procedure, including long treatment time, low security degree and impossibility of continuous industrial production. According the characteristics of product BuNENA and the preformance advantages of thin-film evaporator, the thin-film evaporator was introduced into the BuNENA post-processing procedure, the evaporation process has been simulated and a new evaporator has been designed according to the simulation in this paper. There are main contents as follows:The security analysis of the process was conducted according to the materials characteristics, and the VB calculating program for structure parameters of thin-film evaporator has been developed. And we calculate the minimum evaporation area that is in the evaporation laboratory test conditions is 0.0381m2. The program was revised according to the experimental data of evaporation and the heat and mass transfer, fluid dynamics data obtained via ANSYS CFX simulation, and the minimum evaporation area, which is 0.1816 m2, was recalculated under the pilot test conditions by the revision program. A thin-film evaporator for pilot test was designed. The device parameters are as follows:the evaporation area is 0.2m2, the cooling area is 2m2, scraper diameter is 20mm, scraper speed is 100-500 rpm, electric heating power is 12 KW, the water-jet vacuum pump exhaust volume is 7 L/s. The optimum process parameters used in pilot test are as follows:the evaporation temperature is 140℃, the scraper speed is 200rpm, fluxes 80L/h (20% concentration of BuNENA solution), dichloromethane was cooled by water and low-temperature coolant. The purity of the BuNENA could be up to 99%, and the program simulation degree is 90.8%.Shortor processing time which is just 11.6s; maximum sensitivity is 1.6Nm (BuNENA the sensitivity is 24.5Nm) were showed during the post-processing procedure by using thin-film evaporator treatment BuNENA-dichloromethane solution. And it makes the continuous industrial manufacturing possible.