Study On Laser Interferometric Lithography

Interferometirc lithographic technology incorporates laser, interference optics, diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by National Natural Science Foundation of China. The research for this technology in theory, simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit, developing nanometer electronic and photoelectron devices, novel large screen panel display and novel lithographic equipment of our country.Based on light interference, diffraction and optical holography theory, the paper comprehensively describes the basic principle, main types, development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography.The basic principle, theory, main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution, deep sub-micron and nanometer patterns in large field of view are deeply investigated. Mathematical and physical models for multi-beam and multiple-exposure techniques including single exposure with double-beam, double-exposure with double-beam, single exposure with tri-beam, double-exposure with tri-beam, four-beam and five-beam interference are established. Simulation software is programmed, largenumbers of computer simulation research have been carried out and a lot of useful results have been obtained. An interferometric lithographic experimental system with maskless and multi-beam exposure is built. An experimental system with wavefront divided by a trapezoidal prism and with selectable diaphragms for kinds of multi-beam, multiple-exposure interferometric lithography research is proposed. The experimental study on interferometric lithography is carried out. The simulation and experimental results are analyzed. The main factors affecting interferometric lithographic results are deeply analyzed. The methods for improving interference pattern contrast and period stability are also studied.The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask-hologram mask-resist have been deeply investigated. An experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out.The theoretical research, computer simulation and experimental results analysis show that maskless laser interferometric lithography and holographic lithography have the characteristics of large field of view, high resolution, distortionless, relatively simple system structure, low costs and convenient realization way. They have a broad application prospect. The paper also emphatically studies some main applications of interferometric lithographic technology. It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro-optical element array, micro-structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc.The paper only involves the primary research of interferometric lithography. In order to enable the potential capability of interferometric lithography technology being applied in much more fields, the further deeper research is necessary.