| In recent years, the study in multilayer structure thin films has attracted considerable attention as one of the hot research projects. The material of multilayer thin films has special properties which can meet the needs of various special uses. There is no single-subject films'properities can compare with the multilayer films'. Ti/TiN multilayer films are nano-multilayer thin films in which Ti and TiN are deposited by turns along the vertical direction towards the film surface. Ti/TiN multilayer films have similar prosperities of high hardness and abrasion resistance with Ti and TiN. Moreover, this periodical film applies the alternatively distributed soft and hard structure which can generate good toughness, heat-resistance, corrosion resistance and good optical and electrical property. And the single Ti film or TiN film can not generate such good properties. The past studies focus on the improvement of the hardness and friction properties. They have made a lot of achievements in this field. However, rare studies and explorations can be found in Ti/TiN multilayer films' optical and electrical property.In this work, the best processparameters for preparating single-layer TiN thin film was obtained by the orthogonal design experiments. The optical property and the electrical property of the TiN film were studied with the influence of craft parameters. The model for the particles sputtering speed rate was established. And films'growth mechanism was studied. The model was used to verify the correctness of the influence degree of the craft parameter on the films'structures.Use the best craft parameters were applied in the preparation of the Ti/TiN multilayer films of different layer numbers. The composition, surface morphologies, film's thickness, and the chemical state of the surface atoms were recorded to conduct a deep analysis of the film, proving the films'multilayer structure. Establish the mathematical model of the intra-stress. According to the research, the intra-stress in the film decreases as the temperature increases. The method to reduce the intra-stress was discussed through the model; the law of film formulation by magnetron sputtering was found. The related relationship among preparation craft, thin films'structures and optical and electrical property was attained by the analysis for Ti/TiN multilayer films'optical and electrical property, Ti/TiN multilayer films'ohms per square decrease as the substrate temperature increases. The periodical structure films' resistivity was reduced considerably and the surface morphologies are more even and intensive. There is also a relation between the infrared reflectivity and thin films' resistivity. The infrared reflectivity increases as the resistivity decreases. And the reflectivity decreases as the surface roughness increases. Resistivity decreases and the near-infrared reflectivity of the films increase with the increasing number of the layers. After reaching a certain layer number, the near-infrared reflectivity will not change dramatically with the layer number's change. The thin films ohms per square are smallest and the infrared reflectivity is largest when the layer is 25nm.We studied the influence degree of preparation craft and thin films'structures on the corrosion resistance through the study on Ti/TiN periodical structure thin films' corrosion resistance:the thin films'corrosion resistance is improved considerably with the increasing substrate temperature. When the power of the target is relatively high, more intensive film can deposit and its corrosion resistance is also improved. With the increase in the layer number, the corrosion resistance can be improved. When the layer is about 25nm, the corrosion resistance is the best.
|
PDF Full Text Request