Optical Property Of TiN Films Deposited By Magnetron Sputtering

New type of energy-saving coating glass with low-e and solar control functions was supposed in the thesis on the base of basic physical properties,especially excellent electrical property of TiN films.TiN films were deposited by reactive magnetron sputtering.The deposition rate,compactivity,microstructure,morphology,component, growth orientation of TiN films are affected regularly through controlling some parameters including deposition time,air pressure, sputtring power,nitrogen partial pressure,substrate temperature and bias voltage.The optical transmittance of TiN film in UV-VIS-NIR wave band was analyzed in the thesis,and the influence of sheet resistance and IR reflectivity by the sputtering parameters.Result indicate nitrogen partial pressure,substrate temperature and bias voltage are more important.Aiming at the effects on the microstructure,growth orientation and properties of TiN films,the thesis emphasized on the three parameters so as to acquire some laws for them. In addition,the thesis discussed the influence of target erosion lane on TiN film quality. The research of optical property of TiN film indicate the optical transmittance in UV-VIS-NIR wave band of TiN film decrease regularly with the increase of deposite time,nitrogen partial pressure and bias voltage,and behaves good spectrum selectivity.Low increase of TiN film optical transmittance when base temperature rise up.The VIS optical transmittance is between 35%and 57%.thesheet resistance of TiN film sharply down from∞to low value,then the IR reflectivity quickly climb up.Deposition TiN films at the parameters of t=4min, Pressure=0.4Pa,Power=96W,T=300℃,U_bias=0V,λ_Ar/N2=23 perform good proporty of low-e and solar control functions.