Hardness And Optical Transmittanee Of Ti/TiN Multilayer Films Deposted By Magnetron Sputtering

Ti/TiN multilayer films are nano-multilayer thin films in which Ti and TiN are deposited by turns along the vertical direction towards the film surface. Ti/TiN multilayer films have similar prosperities of high hardness and abrasion resistance with Ti and TiN. Moreover, this periodical film applies the alternatively distributed soft and hard structure which can generate good toughness, heat-resistance, corrosion resistance and good optical and electrical property. And the single Ti film or TiN film can not generate such good properties. The past studies focus on the improvement of the hardness and friction properties. They have made a lot of achievements in this field. However, rare studies and explorations can be found in Ti/TiN multilayer films optical property.Basic on the research and literature about Ti/TiN multilayer films, we obtain the best craft parameters:t=120min, Pessure=0.4Pa, I=3.2A,T=300℃,λAr/N2=20,the modulation period is about 400nm, the modulation is 1:1. Use the best craft parameters were applied in the preparation of the Ti/TiN multilayer films. The composition, surface morphologies, and the chemical state of the surface atoms were recorded to conduct a deep analysis of the film.Result indicate nitrogen partial pressure is more important. Aiming at the effects on the microstructure, growing and properties of Ti/TiN films, the thesis emphasized on the three parameters so as to acquire some laws for them.The research of hardness of Ti/TiN multilayer film indicate that deposition Ti/TiN multilayer films at the parameters of perform good property of hardness and Young's modulus,reach HM0.02N7913 and 156GPa.When the parameters are too high or too low,the hardness and Young's modulus is low than the average.The hardness of Ti/TiN multi-layered films decreased gradually with the increase of the modulation periods, but it increased with the increase of the modulation ratios (the deposition time ratio of TiN to Ti during a modulation period).With the increase in the layer number,the hardness can be improved as the Ti/TiN=1:2,while the hardness can be decrease as the Ti/TiN=2:1.The research of optical property of Ti/TiN mulitilayer film indicate the optical transmittance in UV-VIS wave band of Ti/TiN film decrease regularly with the increase of nitrogen partial pressure, substrate temperature, and behaves good spectrum selectivity. Low increase of Ti/TiN film optical transmittance when base temperture rise up.We studied the influence degree of preparation craft and thin films' structure on the corrosion resistance through the study on Ti/TiN periodical structure thin films' corrosion resistance; the thin films' corrosion resistance is improved considerably with the decreasing nitrogen partial pressure. When t substrate temperature is relatively high, more intensive film can deposit and its corrosion resistance is also improved.