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Research On Theov Stereolt Thography Technology And Application

Posted on:2002-02-19Degree:DoctorType:Dissertation
Country:ChinaCandidate:D H YuFull Text:PDF
GTID:1102360032450234Subject:Machinery manufacturing
Abstract/Summary:PDF Full Text Request
The SL prototyping manufacturing technology in which fabricates parts with accumulate method, is a importantbreakthrough in manufacturing technology field. It can automatically, directly, rapidly and accurately change the designthought of CAD prototype into real prototypes or parts which have certain function, and that achieve rapid estimation,modification and functional test of parts design. Thereby, the technology can effectively shorten the period of research anddevelopment of products. The SL prototyping technology is a RP technology that commercialization is the earliest andapplication is the widest Perfect of its theory and technics as well as reduce of the price etc. have very important infectionfor the popularization and application of the RP technology.In the paper, on the basis of analysis and compare of main performance of various UV radiation source, as wellmatching relationship of absorb spectrum of photosensitive resin and radiation spectrum of the UV radiation source, thedesign project which replaces He-Cd laser source with the far UV radiation source is demonstrated. Accordingly, the basiswhich can realize reduce of running and SL facility price is provided. The optical system of CPS250 is ameliorated.The idea of control radiation energy is brought forward. Firstly from point of efficiency collecting radiation energy, thetheory basis choosing the collect radiation energy project reflecting with the way of the ellipsoid's surface is expatiated. Thestatus of the optical energy space distributing in the focus and its near of the ellipsoid is thoroughly analyzed by means ofoptical wave theory. Simultaneity the necessity adopting luminescence film technology is analyzed. In the paper, the energylosing problem transmitting optical energy with optical fiber is discussed. The infection transmitting optical energy whileoptical fiber curve is analyzed as well. According to the analysis of the essence demand for optical fiber coupling in-outfocusing system, the theory expression of the coupling dispersion spot space distributing is evidenced firstlyBe based upon the molding process and the basic theory of the resin curing, the curing process of the scanning line isanalyzed in detail. The mathematic model of the line's section form is educed scanning by uniform speed, and comparewith the actual section shape of the curing line, their difference is analyzed. The mathematic model of the curing line'slognitudinal section shape is established while accelerative or decelerative scan. At the same time, The idea controllingradiation energy is researched in experiment and is analyzed in theory. The experimental result is presented.The wrapping distortion is analyzed in detail. The wrapping distortion's main reason that is the curing resin'sshrinkage the curing layer's remains stress in the curing process is pointed. Simultaneity the curing manners' character ofdiscrete point exposure, continuously scanning point exposure and mask exposure is expounded. Based on this, the relationbetween the curing manners and shrinkage distortion is dissertated, moreover from point of mechanics the wrap distortionby various curing manners is discussed, The mathematic model and the shrinkage rate's formula corresponding to differentcuring manner is demonstrated firstly. The twice exposure technics of the mask exposure is researched and analyzed firstly.The paper points out that making use of the technics in reason has important signification for improving wrap distortion aswell advancing molding efficiency greatly.Based on the the of the MEMS's basis status, the idea applying RP technology to MEMS is putted forwardfirstly and the mask exposure's project is advanced as well. The mask applying to experiment is opened up and that themask exposure's device is designed and done. The technologic flow of the MEMS unit's manufacture combining opticalscore, sacrifice layer, chymic deposit the SL prototyping is researched and experimental sample is don...
Keywords/Search Tags:UV Stereolithography, Rapid Prototyping, Mask Exposure, Optical System, Shutter, Warp deformation, Micro Electro Mechanical System
PDF Full Text Request
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