Experimental Research On WS₂ Films Preparation And Tribological Performance

As the development of science and technology, especially flourishing development of space technology, the requirement of lubricating material has been increasing accordingly. Development high-performance solid lubricating material has been exigent problem. As a late-model excellent solid lubrication films tungsten disulfide films performance is better than classical molybdenum disulfide films in some aspects. So the tribological behavior of WS2 films has been paid more and more attention. Comparing with foreign study, the domestic research of WS2 films was carried out later. The lubricating mechanics of WS2 films still needs discussing, some new phenomenon needs discovering and the WS2 films are not extensive used in practical application now. The mineral reserves of W, Mo in our country is abundant, but according to some countries like USA, Japan, etc, the quotient of solid lubricant application has not reached moiety. So research of WS2 films is significant.In this paper, tungsten disulfide thin films were prepared by sulfuration method and RF sputtering on 3Cr13 martensite restless steel. The effects of process parameters on the properties of WS2 films were investigated by characterization and testing on film structural, surface topography, chemical constitution, friction wear properties, etc. It offers a useful reference for generalizing of WS2 films in correlative fields.The research showed that WS2 films could be obtained by sulfured tungsten oxide thin films on 3Cr13 martensite restless steel. Sulfurizing temperatures influenced surface topography and crystallization obviously. But the influence on chemical constitution was not obvious. The frictional behaviour of stain less steel basal plant was improved by these films. When sulfurizing temperature raised the fiction coefficient of the films reduced and the fiction coefficient were also influenced by testing environment and conditions.When the WS2 films deposited by RF sputtering, the performance of films would be influenced by the changes of power, pressure and deposition time. The chemical constitution namely S/W ratio were impacted by sputter technological parameter obviously. The coefficient of friction of the sample prepared by RF sputter had inversely-proportional relationship with S/W ratio in definitive range.The effects of Ti and Ni transition layers and vacuum annealing on frictional behavior of tungsten disulfide thin film preparation with RF sputtering on substrate was also researched in this paper. The results showed that Ti transition layer didn’t influence tungsten disulfide films’structure, S/W ratio and frictional coefficient observably, but the abradability of this film was enhanced. The S/W ratio of tungsten disulfide film was not influenced observably by Ni transition layer, but the intensity of textureⅡ(basal plane orientation)of tungsten disulfide thin film was strengthen obviously by Ni transition layer, then the frictional coefficient of this film was reduced and the abradability of the film was enhanced. And suitable vacuum annealing was able to promote crystallization and improve tribological performance of RF sputtering WS2 films. But sometimes the films could be desquamated from substrate because of embrittlement.