| As a newly emerged ionized physical vapor deposition technique, High Power Impulse Magnetron Sputtering(HIPIMS) has become a research hotspot at home and abroad. Compared with the traditional Direct Current Magnetron Sputtering(DCMS), the discharge system of HIPIMS has much more higher plasma density and the sputtering metal ionization rate. The film structure is smooth and dense. The adhesion of the film and substrate is stronger. The comprehensive performance of film is more excellent. However, the low deposition rate and utilization efficiency of electronic are its fatal flaws, which seriously restricted the development of the technology. Aiming at the existing problems of this technology, this paper proposed a new method of Electric-Magnetic Field Hybrid Enhanced HIPIMS, which has higher utilization efficiency, higher ionization rate and higher deposition rate. And the discharge plasma characteristics and emission spectrum of this technology, structure and properties of vanadium films were studied.Using the additional electrode enhanced HIPIMS discharge achieved EFHIPIMS. The results of EF-HIPIMS plasma discharge characteristics show that with the increase of electrode voltage amplitude, the substrate ion current increased. The reason is that the electric field intensity near electrode and distribution range increased and the potential near the substrate became positive. Two sides worked together. With the electrode position changed from 45 degree position to 180 degree position, the substrate ion current shows a decreasing trend step by step. When the additional electrode appended additional diffusion of unbalanced magnetic field, the substrate ion current obtained a maximum. With the increase of pressure, the substrate ion current under different bias voltage increased gradually, which formed a saturation value. With the increase of the target substrate distance, the mean substrate ion current decreased gradually.The unbalanced system magnetron field has been established which used coaxial electromagnetic field. The magnetron field enhanced HIPIMS is formed by applying unbalanced system magnetron field. The magnetic field distribution before cathode target were simulated. The results of the the magnetic field strength before target and glow discharge morphology before target showed that with the increase of excitation current, the feature of system magnetron field unbalanced enhanced. The plasma can effectively be promoted to depositon area by the stronger unbalanced magnetic field.The substrate ion current at different excitation current increased with the increase of target voltage.Using additional electrode to electric field to adjust electric field and electric potential distribution in the vacuum chamber at the same time using coaxial electromagnetic coil to optimize the magnetic field distribution before the cathode target, which achieved Electric-Magnetic Field High Power Impulse Magnetron Sputtering technology. The research on this technology about discharge plasma properties were found, electric-magnetic field hybrid reinforced HIPIMS discharge would not only fully focused extending to the before the target plasma region matrix but also the plasma discharge region of the system greatly be expanded, which showed the discharge characteristics of system particle from of high plasma density and high ionization rate. Strengthening the magnetic hybrid effect of HIPIMS discharge generating electricity, there are the critical threshold for electrode voltage and excitation current. This is due to the competition between electric field and magnetic field, which significantly prolonged electron movement distance and increased the probability of ionization through electron impact. The substrate ion current decreased linearly with changing from the 45 degree position to 180 degree position. The substrate ion current gradually increased with the increase of the electrode voltage. The substrate ion current linly increased with increase of electrode voltage. The substrate ion current linly increased with the increase of excitation current.The research results of the system plasma distribution of the different external field enhanced HIPIMS discharge show that the substrate ion current of electric field enhancement of high discharge in vacuum all indoor location system increased, plasma density could increase the highest to 3 times. The increase of the magnetic field HIPIMS discharge with increasing excitation current, ion current collected at different locations increases gradually, the highest system total could increase to 1.75 times. The substrate ion current of electric-magnetic field hybrid reinforcing HIPIMS discharge increased at each position acquisition in vacuum system in different degree increasing, the system ion current density could increase the highest to more than 5 times.The results of plasma emission spectrum show that, the strength of Ar(0), Ar(1+), V(0) and V(1+) four particles peak spectral were the highest in electric-magnetic field hybrid reinforcing HIPIMS discharge at the same average power. At the same time, the strength of V(2+) peak spectral line intensity is relatively high in the system, which indicated that the ionization rate of Ar and V was higher, the system plasma densities were higher.Vanadium films were prepared using electric-magnetic field enhanced high power pulse magnetron sputtering technology and the morphology, structure and properties were studied comparatively. The results show that, compared with HIPIMS, the intensity of(111) diffraction peak of vanadium film prepared by electric-magnetic field hybrid reinforced HIPIMS is strong, the SEM surface morphology of vanadium films exhibit " dimpled surface features ", whose surface was smooth and the surface roughness was smaller. The structure of vanadium films was small, dense equiaxed fine grain morphology. The deposition rate of vanadium films increased by 62% at the same average power. The friction coefficient of vanadium films is lower, and the surface of the sample was slight and does not appear obvious signs of wear scars peeling. Compared with the substrate, electricmagnetic field composite reinforced vanadium film HIPIMS Icorr decreased by two orders of magnitude, Ecor increased 0.785 V, exhibited superior corrosion resistance. The deposition of vanadium film samples had good wear resistance and corrosion resistance performance after heat treatment at 200 degrees and 300 degrees, which was composed of vanadium films and film surface oxidation occured due to the change of state. |
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