Effect Of Volt-Ampere Characteristics Of Dual Power Pulse Electric Field On Microstructure And Properties Of Pure Ti Thin Films

In allusion to the presently technology inadequacies that magnetron sputtering ion plating possess poor uniformity due to the low ionization rate of deposited particles. Based on the physical gas discharging plasma theory, the effects of magnetron cathode electric field modes on the micro structure and properties of pure metal thin films were investigated. Based on the observable micro structure and measurable hardness. The escape-target mode of deposited particles in the power pulse electric field with microsecond period were difficult to observe directly. This paper constructed a high power pulse and a double pulse electric field with a large current density and a strong electric field intensity. The gas discharge can be introduced into the glow-arc transition discharge section (strong glow and weak arc) using high power pulse and dual power pulse electric field with a large current density and a strong electric field intensity. By means of the collision kinetic energy of Ar+ and the Joule heating effect of electrons, the electrons and atoms could be spontaneously induced to emit by overcoming the surface work function.That is, deposited particles can achieve achieve collision-enhanced heat emission off-target, and improve the micro structure of the deposited film and comprehensive performance.The results show that under the same average power condition, the peak current density in the direct-current(DC) electric field is at a small value (0.04 A/cm2), the gas discharge is in the glow area, the film exhibits loose and compact structure, the grain size is 28 nm. the surface roughness is 127 nm, which indicates that the collision target is difficult to obtain high energy and high ionization rate of the deposited particles lead to poor film performance. When a high power pulse and a dual power pulse electric field are used, a peak current density of more than 0.5 A/cm2 can be obtained, and when the measured current density reaches 0.2 A/cm2, the gas discharge enters the anti-ohmic region, indicating that the pulsed electric field environment The gas discharge is introduced into the strong glow and weak arc region, and the transition from the Ar+ collision collision mechanism to the Ar+ collision and the target heat emission is realized.The deposited film exhibits a dense structure with a grain size within 20 nm and a roughness of about 20 nm. And the average deposition rate of the dual power pulse electric field is 45.7 nm/min,which is about twice the high power pulse and close to the DC deposition rate. Not only the thickness of the target is 240 mm, the thickness is 1.496 ?m, which is significantly larger than the other three groups. The thickness ratio of the front and the back is 2.51 closest to 1, indicating that the collision-enhanced thermal emission off-target method can obtain the deposited particles with high ionization rate and energy, which can improve the uniformity of the film thickness in the vacuum chamber, and the film has dense and good microstructure, excellent membrane-based bonding strength and mechanical properties.Based on the study of the structure and properties of the thin films deposited at different peak current densities in the dual power pulse electric field. With the increase of the peak current density, the thickness difference between the near target and the far target is smaller and smaller,and the thickness reduction rate along the target distance is reduced from 90 % to 77.8 %, the thickness ratio is 1.91. By shortening the pulse turn-on time, not only the peak current density is increased, but also a sufficient pause time in the single pulse, so that the highly active and diffused deposition particles are formed on the substrate surface. With the increase of the target peak current density, the microstructure of the film is more and more dense. When the peak current density is 1.35 A/cm2, the critical load of the scratch test is up to 13.7 N and the scratches do not appear, and the elastic modulus is 5.625GPa and 165.380GPa respectively. The corrosion rate in NaCl solution is only 1.9655 ×10-4 mm/a. Finally, a thin film with excellent structure and excellent performance can be obtained by constructing a new dual power pulse electric field and regulating its current density.