Impact of large scale substrate roughness on giant magnetoresistive thin films

This dissertation presents an investigation on the effects of large scale roughness on the properties of giant magnetoresistive multilayers. The large scale roughness (sigmarms > 5 nm) is introduced into giant magnetoresistive thin films through the substrate. Current-in-plane (CIP) and current-perpendicular-to-the-plane (CPP) thin films were deposited by dc magnetron and triode sputtering. All films were characterized for roughness, magnetic and electronic behavior.;Our research on both pseudo spin valves and exchange-biased spin valves shows that long length scale roughness does not have a significant detrimental effect on GMR thin films. For the CIP films, we find that a decrease in GMR correlates to an increase in minimum film resistivity. As the minimum resistivity increased, the maximum resistivity increased linearly with a slope ∼1. This suggests that the decrease in GMR may primarily be an effect of increased spin-independent scattering resulting from the increased film roughness. The CPP films showed a similar relationship between minimum and maximum resistance. Studying the effect of such large scale substrate roughness is important for applications in which GMR multilayers are deposited on non-standard substrates and buffer layers including flexible media.