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Physical properties of thin film, metastable titanium(0.5)aluminum(0.5)nitrogen alloys deposited by reactive magnetron sputtering

Posted on:1990-06-10Degree:Ph.DType:Dissertation
University:University of Illinois at Urbana-ChampaignCandidate:McIntyre, Dale CharlesFull Text:PDF
GTID:1471390017953581Subject:Engineering
Abstract/Summary:
etastable, NaCl-structure, polycrystalline Ti;The ion flux to deposition flux ratio was about unity and for an applied substrate bias V;Films deposited with V;The optical reflectance, R, of the metastable films was measured in the visible and infrared spectral regions at wavelengths,...
Keywords/Search Tags:Metastable
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