The Fabrication Of Photorefractive Photonic Lattice With Defect

Photonic lattices are a kind of minuteness optics dielectric structure which its space measure is on the level of the wavelength of light-wave. The most remarkable character of the photonic lattices is that it possesses the photonic gap, but a complete periodic photonic lattices can not change photonic action when the light-wave transmit through it, only the Photonic lattices with defect can do it. That the production methods of photonic lattices with defect become the major bottleneck .Recently, the light-irradiation methods have a great development, and makes convenient fabricate various integrated photorefractive photonic lattices. It was deemed a optimal technology with photorefractive photonic lattices, this methods have many advantages of real time, high-speed, materials can be recycled and the lattices and the defect can implanted at the same time. The defect was embedded into integrity photonic lattices, which it can bring many progresses to it. Photonic lattices within defect hold the capability of control the light and obtain the great progress. When the frequencies of testing light were equal with the photonic gap with defect model that it can be localized and transmit along it. Thereby, it has played an important role in the development and application of the photonic lattices.In this thesis, we use sheet-light method and cross phase method fabricating two-dimensional photorefractive photonic lattices within linear-defect and point-defect. In experiment and theoretic we analysis and research the mechanism of controlling light. Furthermore we discuss the experiment condition and the influence of fabricate the defect in two-dimensional photonic lattice. In experiment, we observe the phenomenon of infrared light photorefractive in LN crystals, in theoretical we analysis the mechanism about photorefractive effect induce by near infrared light in LN crystals. The main works as follows:1. We fabric defected photonic lattices with sheet-light method: By this method we fabric two-dimensional photorefractive photonic with linear-defect which is the level of micron. The advantage is that simple device, easy adjustment and only revolving the column lens that can fabric various linear-defect in photonic lattices, they have different orientation relative to c-axis. The disadvantage of sheet-light is divergent and can not make more small defects, and can only use thin crystal in experiment. In theoretical analysis, we simulate four-hole mask and column lens, gained the linear-defect photonic lattices finally.2. Fabric point-defect photonic lattices with cross phase method: In the base of cross phase method, change defect mask make the focus of two write light on one point in crystal, we fabric two-dimensional photorefractive photonic within point-defect successfully. The advantages are that defects light are not divergent and just transforming mask can fabricate different types of photonic lattice. The disadvantages are complexity of device, not easy to adjust. Analyze the different condition of the experiment, and find out the optimal condition to fabric point-defect photonic lattices. In theory, we simulate the mask through mathematics tools; found that the theoretic accord with experiment very well.3. Mechanism research about photorefractive effect induces by near infrared light: in experiment, uses the focus near infrared light arouse photorefractive effect in LN crystal with indium. Prove that the photorefractive effect in LN crystals was inducing by Laser Frequency Multiple, explain the mechanism over again. According experiment and theoretic we simulate the change of refractive index in crystal.