Study On The Preparation And Properties Of Nano-Structured SiO₂ Thin Films

Nano-Structured SiO2 thin films were prepared on the substrate of carbon steel for the first time. Nano-structured SiO2 thin films were produced onto the substrate of carbon steel through the Liquid Phase Deposition method by dipping the substrate into the water glass solution. The influences of filming conditions on the films prepared were discussed. Water glass solution was utilized to fabricate thin film on substrate for the first time. The film prepared had good protection to the substrate of carbon steel. The compositions and the depth of the film prepared were analyzed and measured by XPS and SAM, respectively. The results showed that SiO2 constituted the film and the depth of the film was about 20nm. There was a diffused-layer which depth was more than 60nm located between the SiO2 thin film and the substrate of carbon steel. AFM images of the surface morphologies of the thin films showed that the thin film prepared was composed of compact particles of SiO2. The particles were spherical in their appearance and have the diameters of about 30nm.The mechanism and process of film forming were supposed by considering both the composition, the depth profile of the film and the properties of water glass solution.