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Research And Development On The Program Controlling Pulse Plating Power Supply

Posted on:2006-06-26Degree:MasterType:Thesis
Country:ChinaCandidate:Y LiuFull Text:PDF
GTID:2121360182456494Subject:Instrumentation engineering
Abstract/Summary:PDF Full Text Request
For the reason of more and more higher requirements for metal surface plating layer for military application of electronic parts, In order to improve Plating technology accordingly, we summarized Plating equipments and Plating technology which exists in our research department, and compared the developing actuality between domestic and worldwide, therefore put forward a new consideration and idea of design, and developed Program Controlling pulse Plating Power Supply accordingly.Firstly, the paper mainly introduced several existing pulse Plating Power Supply that were applied in domestic and foreign plating equipments, and expatiated the developing status; secondly, summarized the basic specification, classification, working principle and characteristics in detail. Introduced the main performance, functions and explained the design of hardware system and software system of PIC pulse generator. Finally, analyzed and compared the test data of bend test, anti-fatigue test and salt corrosion test for plating samples. The analysis and comparison for the test data proved the advantage of the Program Controlling pulse Plating Power Supply.
Keywords/Search Tags:plating power supply, pulse, program controlling, PIC, test
PDF Full Text Request
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