A Study On Preparation And Mechanical Property Of TiN/AIN Nanomultilayers

Surface engineering, as a newly synthesis subject, has been progressed rapidly in recent yeas .It was proved that the application of surface engineering can excellently improve surface property of material, which can improve productivity and save resources. There has been an increasing interest in hard thin film because of their high performance in improving the properties of tools and products, such ad cutting properties, wear-resistance, lifetime, or even the appearance. In the past two decades, nano-scale multilayers have attracted a great deal of attention since their superior comprehensive mechanical properties at small modulation period and this also make them promising hard coating materials. Property anomaly of nanoscale nitride/nitride multilayer makes it possess important values in theoretical investigation and practical application in engineering, which arouse much attraction.TiN/AlN nano-multilayers were deposited by a new combined ion source unbalance reactive magnetron sputtering setup. The microstructure and hardness of film was characterized by X-ray diffraction, transmission electron microscopy, scanning electronic microscope, micro hardness tester and optical interferometer. The relationship between properties and processes was studied and the optimum process was got. The main results as follow:(1)The study on TiN deposited by a new combined ion source unbalances reactive magnetron sputtering setup. The four main influential factors such as bias voltage, gas flux, current of gis and deposition temperature have been studied. The laws of these factors in fluent coating depth and properties have been found. Conclusions: deposition temperature at 200℃; gas flux is 35sccm; bias voltage is 150V; current of gis is 6A; target current choose as 12A. TiN coatings have optimum composite properties. The color of film is golden; the hardness as to 2600Hv; cohesion as to 41N.(2) The study on TiN/AlN nanoscale multilayer deposited by a new combined ion source unbalances reactive magnetron sputtering setup. The main point study was mechanical properties, TiN/AlN nano-multilayer with small period show higher hardness than TiN coating. The hardness of the film has peak point when gas flux and bias changed. Conclusions: deposition temperature at 150℃; gas flux is 45sccm; bias voltage is 100V; current of gis is 6A; Ti target current choose as 10A; Al target power is 5.5KW. TiN/AlN nano-multilayer have optimum composite properties. The hardness is 3100Hv; cohesion is 50N. The hardening mechanisms of TiN/AlN nano-multilayer was H-P effect and the interface get a strong barrier to dislocation motion. It was shows that TiN/AlN nano-multilayer have better anti-oxidize and anti-corrosive properties than TiN films through oxidation and corrosion experiment.