Research On Process And Mechanical Propertiesof Nano-hardness Films Deposited By Magnetron Sputtering

Ti N, Ti Al N, Cr N, Cr Al N, Ti Al N/Cr Al N transition metal nitride film, are widely used as hardness film material, have a large number of applications in tools, decorative materials, molds, biotechnology, aerospace and other aspects because of its high hardness, wear resistance, high resistance to oxidation and other excellent performance.Most previous studies have focused on a certain kind of film and obtained regular patterns were poor. Therefore, this paper systematically studied the relationship between technology, structure and properties of Ti N, Ti Al N, Cr N, Cr Al N, Ti Al N / Cr Al N films and discussed the mechanical evolution and mechanism of films form monolayer to multilayer, and provided basic data and theory for researching and developing of the higher performance hard films.Ti N, Ti Al N, Cr N, Cr Al N, Ti Al N/Cr Al N five kinds of films were prepared by magnetron sputtering, systematically investigated the effects of the negative bias voltage, sputtering current, Nitrogen flow rate and Argon flow rate on surface morphology, microstructure and mechanical properties of Ti N and Cr N films, investigated the effects of Al target power on surface morphology, microstructure and mechanical properties of Ti Al N and Cr Al N films, investigated the effects of the modulation period Λ on microstructure and mechanical properties of Ti Al N / Cr Al N periodic multilayer. The surface morphology, composition, microstructure and hardness were characterized by laser scanning confocal microscopy, scanning electron microscopy(SEM), X-ray diffraction(XRD) and nanoindentation,.Viewed the minimum surface roughness of Ti N, Ti Al N, Cr N and Cr Al N filmes by confocal laser microscope were: 7nm, 17 nm, 3nm, 5nm, respectively.The maximum hardness values of Ti N, Ti Al N, Cr N, Cr Al N, Ti Al N/Cr Al N films obtained by means of nanoindentation were: 21.27 GPa, 16.81 GPa, 23.50 GPa, 24.01 GPa, 32.51 GPa, respectively.Through investigating the hardening reason of Ti Al N/Cr Al N periodic multilayer, the hardening reason of Ti Al N/Cr Al N periodic multilayer is Hall–Petch effect when the grains can contain dislocations.