Study On New Polishing Technology And Mechanism Of Textile Ring

This paper applies chemical mechanical polishing (CMP) technology to polishing process for textile ring creatively. It is verified that CMP technology has the advantage of high polishing efficiency and good surface quality compared to abrasive flow machining (AFM) technology through polishing experiment.On the basis of orthogonal test of spinning rings, the best level combination under the factors of rotational velocity, volume ratio of abrasive and so on are gained and the results are satisfactory according to experimental data.Using method of computational fluid dynamics (CFD), it is found out that the shape of barrels and the flow-pattern characteristics of the abrasive fluid in planetary barrels are closely related to the quality and efficiency of rings. And it is an important parameter of planetary driver ratio to change the fluid characteristics. In this paper, analysis of the impacts of different planetary driver ratio on kinematic characteristics is proved acceptably and in accordance with maps of high speed photography by CFD method. Through this comparison, it is found that abrasive experienced three stages, from stacking stage to dispersion stage, and to stacking stage with increasing of ratio. It is clear that machining efficiency is more sensitive by dispersion extend, and rings away from abrasive are hardly polished. The scope of the planetary driver ratio is determined in the end.Finally, polishing mechanism is analyzed, which shows that a soft layer formed by the polishing solution on the spinning rings surface leads to increase in the polishing efficiency.