Ultra Smooth Polishing Processing Research Based On The Cluster Magnetorheological Effect

With the development of microelectronics and optoelectronic technology, there is an increasing demand to hard brittle material's machining accuracy and the surface quality, such as optical glass, silicon and project ceramics, it needs to achieve ultra smooth surface generally. But this kind of material's brittleness is high and the machinability is bad, so it is extremely easy to have damages on the processing surface. Because of the tradition abrasive machining method's efficiency is low, and the processing quality is not easy to control, it is difficult to meet develop need. Therefore, how to realize ultra-smooth polishing to hard brittle material have been become an important research issue in ultra-precision processing technology area, receives widespread attention.First, the author analyzed the principle of the cluster MR-effect plane polishing, a new method-cluster MR-effect polishing which formed by cluster distributed magnetic body has been put forward based on the principle of MR polishing processing in this article. The conclusion that the different magnetic pole arrangement is superior to the same magnetic pole arrangement gets through simulation analysis to magnetic pole, the structure of the polishing disk is designed optimally, and the movement of abrasive trajectory is analyzed through simulation. By analyzing the magnetorheological finish working fluid's composition, properties, rheological mechanism and performance requirements, the proportion of various components are optimized.Next, this article has developed a cluster MR-effect plane polishing experimental device, and design optimally to its component, such as rotary polishing disk, adjustable magnetic device, recycling and storing device and clamping workpiece device. Have carried on the feasible processing experiment to K9 optical glass, silicon and YAG ceramics, the surface roughness of K9 glass, silicon and YAG ceramics can achieve respectively Ra0.005μm, Ra0.016μm and Ra0.015μm finally after processed. The result indicated that the cluster MR-effect plane polishing method is feasible, can realize high accuracy polishing.Finally, using the experimental device and the magnetorheological finish working fluid which is selfmade, carries on the polishing experiment to K9 glass and silicon.The influence rule of parameters on processing effect is obtained, such as the polishing time, the machining gap. the magnetic field intensity, the speed (the rotational speed of polishing disk, the rotational speed of work piece disk and swing speed), the carbonyl iron consistency, the content of abrasives, the abrasive material type, the the size ratio of abrasive and iron powder. Summarized the technological parameter optimization selection principle. Based on the technological parameter optimizes, carries on the processing experiment to the different type material's work piece, explores the processing effect to different material in using the cluster MR-effect plane polishing method, expands the method's application scope. The experimental study indicated that the cluster MR-effect plane polishing method is feasible, and the designed processing equipment has good workability.