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Influence Of Vacuum Annealing On Yttria Dispersed Ferrum Films Prepared By Magnetron Sputtering

Posted on:2011-05-25Degree:MasterType:Thesis
Country:ChinaCandidate:X Y YuFull Text:PDF
GTID:2131330338490463Subject:Materials Science and Engineering
Abstract/Summary:PDF Full Text Request
Oxide dispersion strengthened alloy was well known for its application in nuclear industry and refractory materials. In the present study, yttria dispersed ferrum films were prepared by double-target magnetron co-sputtering method. Structural, mechanical, anti-irradiation and magnetic properties of the films were studied. Vacuum annealing and xenon ion irradiation were conducted to investigate the characteristics of the films.The thickness and component ratio of the yttria dispersed ferrum films could be regulated by means of double-target magnetron co-sputtering. Well yttria dispersed ferrum films could be prepared by means of double-target magnetron co-sputtering。Characterization of the films after vacuum annealing and xenon ion irradiation demonstrated that, with the increasing of yttria doping ratio in the ferrum film, the recrystallization temperature of the film would be elevated and irradiation stability would reduce. Precipitated phase in the annealing process varied with the vibration of the yttria doping ratio. Precipitated phase was Fe2O3 in low Y/Fe ratio (less than 0.6 %) film, while the ratio increased and precipitated phase changed into FeYO3。Further discussion indicated that, during vacuum annealing process, the properties of the films were controlled by two effects which were precipitated phase and crystal grain growth. Before complete crystallization, precipitated phase effect was the main factor, leading to enhancement in nano-hardness, irradiation stability and coercivity of the films. However after complete crystallization, the main factor changed into crystal grain growth, leading to reduction in nano-hardness, irradiation stability, magnetic anisotropy and coercivity of the films. Vacuun annealing provided an easy and effective way to adjust the mechanical, anti-irradiation and magnetic properties of the films. For the preparation of Fe-Y2O3 film with layered structure, the magnetron sputteringequitment was improved by adding an accessory designed by the author himself. The magnetic properties of the films were investigated, which would be helpful for the further research of layered structure.
Keywords/Search Tags:Yttria, Ferrum film, Magnetron sputtering, Vacuum annealing
PDF Full Text Request
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