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Reach On Pressure Processing For Producting High Pure Aluminum And Ce And Gd Target Materials

Posted on:2011-11-04Degree:MasterType:Thesis
Country:ChinaCandidate:Y H ZhangFull Text:PDF
GTID:2131330338978783Subject:Materials Processing Engineering
Abstract/Summary:PDF Full Text Request
Sputtering method is the one of main technologies to produce the film material. And the raw material of sputtering film is target material. The applications of high purity aluminum target material are the semiconductor chip and flat panel displays industry, and rare earth Gd and Ce target materials are magnetic record and optical record industries. There are some requirements for high quality target materials as following: 1).high purity and low inclusions; 2).high tightness density; 3).homogeneous compositions and microstructures; 4).small sizes of grains.The grain size of high purity aluminum target materials is between 200μm and 300μm, and the main texture is (100). On the other hand, high tightness density is the main requirement for rare earth target materials. The main aim in this study is to investigate the high aluminum target materials and rare earth target materials on the basis of the above requirements.The formation of high purity aluminum is employed by cold roll and hot forge. After recrystallization annealing with constant temperature salt bath, the sample is observed by Axiover 25 Zeiss optical microscope. Through a series of annealing and microstructure observation, we determined the optimal pressure processing and recrystallization annealing processes as follows: on the conditions of 40% cold rolling reduction, the annealing temperature at 330℃, holding 10min time, water quenched. It can obtain high purity aluminum with the better grain size less than 200μm and homogeneous structures from the microstructures photographs after the optimal temperature and time of recrystallized annealing. And one of the two cold-rolled samples and a hot forging annealed samples were annealed recrystallization texture analysis. From the observation of ODF, we can obtain results though analyzing of ODF photographs as follows: three high-purity aluminum annealed samples obtained (100) recrystallization texture.because of the low deformation of aluminum, we achieved the low intensity textures. Two cold-rolled annealed samples had the features of similar deformation texture at the range of 45°≤ph2≤90°, but the texture intensity of samples at high temperature annealing decreased significantly; forging annealing had different texture compared with cold rolling, the total texture intensity is lower.The method of the formation of rare earth Gd and Ce cast ingot is cold rolling. But rare earth metal easily is oxidized, and its plasticity is poor,its hardening rate is high, it is difficultly to execute pressure processing. The total deformation is up to 80% or more before rolling and passing in vacuum annealing, the samples can be obtained. After density measurement, the density of Gd samples is increased with 0.547%, the density of Ce samples is increased with 0.547%, the increase of the total deformations, and gradually close to the value of theory density.
Keywords/Search Tags:target material, pressure processing, recrystallization, texture, density
PDF Full Text Request
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