| In this paper, a series of Ti-0 films with different surface characteristics were synthesized by unbalanced magnetron sputtering and etched subsequently by Ar ion. The surface characteristics of Ti-0 films were investigated using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and Atom force micrography (AFM). The wettability of Ti-0 films was studied by a contact angle method. The biological behavior of cultured human umbilical vein endothelial cells (HUVECs) onto different film surfaces was evaluated by the in vitro HUVECs cultured experiment. This work furthermore focus on the influence of surface characteristics of Ti-0 films such as the ratio of oxygen to titanium, surface roughness, and wettability on the biological behavior of cultured HUVECs on different film surfaces.The results of XRD indicated that the structure of film is uninfluenced before and after etched by Ar ion. The XPS results disclosed that the ratio of oxygen to titanium of the etched Ti-0 films was controlled by etching process. With the increased etching degree of films, the ratio changed as a regular pattern of wave. In addition, the Ti-0 film composition varied with etched time or wafer temperature of film from nonstoichiometric ratio to stoichiometric one. The AFM micromorphology of films illustrated that the surface roughness of films is mostly decreased after etched. However, the higher roughness of film surface was appeared while the etching voltage was very low. The wettability of Ti-0 films was also influenced by etched process besides etching voltage.The in vitro HUVECs cultured investigation of Ti-0 film surface justified that the Ti-0 film is recognized by endothelial cells in a survival time of periodicity, and that the biological behavior of HUVECs on different feature surfaces was... |
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