The Research Of Deposition Mechanics In Longitudinal Magnetic Field

Shielding the magnetic field in the cathode of the traditional magnetron sputtering device and introducing a magnet below the substrate, let the magnetic field under the substrate take action during sputtering. In this way, the effect of the longitudinal magnetic field on the movements of the plasma during deposition can be investigated. The appearances of the films deposited by this means are: in the center of each film, there's a spot, and the spot is surrounded by some loops. But the film thickness of the spots is changed with the elements of the targets and the height of the substrate over the magnet. We tried to know the formation mechanic of this novel phenomenon from three angles. In the angle of quantum mechanics, we think about the wave character of the deposition particles. Secondly, we consider maybe our phenomenon is one of the macroscopic quantum effect. Finally, because of the non-uniformity of the magnetic field, the deposition particles will gain lateral magnetic field force during their movements; we calculate the lateral deviation directly. Disappointedly, these three means can't explain our experimental phenomenon. Now we hold that there's a large number of ions in the sputtering space besides electrons and the atoms of the targets. These ions will be bounded by Lorentz force and gradient magnetic field force and their interaction force during their motivation from the target to the substrate. That's why the spots and loops generate. And in this way, we get some opinion on the deposition mechanics in this longitudinal magnetic field.