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Research Of Membrane Thickness Control System On CPLD And Virtual Instrument Technology

Posted on:2006-12-14Degree:MasterType:Thesis
Country:ChinaCandidate:Q S MiaoFull Text:PDF
GTID:2132360185464043Subject:Physical Electronics
Abstract/Summary:PDF Full Text Request
Today photoelectric technology makes a great progress. The technology and equipment of plating are also developing and advancing continuously. At present, in the practical preparation technology of the soft X-ray multilayer membrane, membrane quality of Ion bundle splash shoot(IBS) is better and has no electromagnetism wave to disturb. It is easily to control the process of plating in real time. Now people think generally IBS is the most effective and developmental future for preparation soft X-ray multilayer membrane.This paper discusses the principle of membrane thickness measurement and the research of membrane thickness control technology, as well as the R&D of an intelligent control equipment. The overall structure of the membrane thickness control system based on CPLD is introduced in this system. As having adopted CPLD skill , the structure and cost of the system are reduced considerably. This paper discusses systematic hardware design, emulation and experiment result in detail . In the research of the membrane thickness control system of IBS plating machine, as having adopted modern detection means, measure precision improves greatly. Furthermore, having adopted automation in this paper, artificial factor disturbance is rejected in the controlled process. Control is accurate and labor productivity is increased.
Keywords/Search Tags:plating machine, membrane thickness control, based on CPLD, virtual instrument
PDF Full Text Request
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