Research On Techniques Of Inductively Coupled RF Plasma Cleaner

This thesis researches the inductively coupled RF plasma cleaning machine and cleaning techniques. Late plasma developing, ICP( Inductively Coupled Plasma) are the other new way. ICP has high ion energy. It is very easy to implement the structure that electrode out of the vacuum chamber. The ICP machine has application and development potential.Development needs inductively coupled RF plasma cleaning machine is the military microwave vacuum electronic devices. The development trends of vacuum electronic devices is miniaturization and high reliability. The wet cleaning technology has been unable to vacuum electronic devices. The research of ICP cleaning machine is very necessary and urgent.The thesis research generation of plasma, the characteristics of the RF plasma and plasma cleaning mechanism. There are many ways to generate the plasma, the different characteristics of different plasma generation method suitable for various industrial applications. Many features determine the application of RF plasma edge in industrial cleaning, so the research and development of RF inductively coupled plasma cleaning machine is based on application requirements and theory.The thesis describes the development process of inductively coupled plasma cleaning system for the development and innovation of the difficulties have been described and presented the successful development of equipment components and configurations.Finally, the research work are summarized the achievements and shortcomings, pointed out the direction and content of future research.