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Study On Generation And Cleaning Effect Of Low Pressure RF Plasma

Posted on:2022-04-06Degree:MasterType:Thesis
Country:ChinaCandidate:R K YeFull Text:PDF
GTID:2480306536493704Subject:Power Machinery and Engineering
Abstract/Summary:PDF Full Text Request
Plasma cleaning technology uses high-energy plasma to bombard the surface to be cleaned,and contaminants are removed from the metal surface.At the same time,the active particles produced by the ionized gas will chemically react with the organic matter or oxide on the surface to generate easily volatilized substances,and the contaminants are exhausted by the vacuum pump to achieve the cleaning effect.Plasma cleaning technology has the advantages of easy operation and low cost.In the current working process of plasma cleaning equipment,there are changing electromagnetic field and plasma inside the discharge cavity.The existing common plasma measurement methods can't be used because the dynamic changes of the magnetic field.Therefore,the existing plasma cleaning equipment can only set the power,and investigate the cleaning effect of the equipment under a certain discharge power.The actual cleaning effect is directly related to parameters such as plasma density and electron density.However,the existing research failed to establish the corresponding relationship between the plasma parameters and the cleaning effect.In view of this situation,this paper combines numerical simulation and experimental research to establish the relationship between plasma parameters and cleaning effect.First the design and processing of the capacitive coupling plasma cleaning machine are completed based on theoretical research,including the determination of the overall plan,the design of the mechanical structure,the design of the control system,and the selection of seals.Furthermore,a simulation calculation was carried out according to the developed capacitive coupling plasma cleaning machine model,and the distribution of the main plasma parameters in the cavity was obtained through simulation;Finally,the experimental study was carried out to discuss the effect of cleaning time and power on the cleaning effect based on the plasma cleaning machine,and the effect of cleaning time on the characteristics of the metal surface.By comparing the simulation results with the experimental results,the relationship between the plasma electron density,the number density of charged substances and other parameters and the cleaning effect is obtained.
Keywords/Search Tags:Capacitive coupling, Plasma cleaning, Cleaning mode, Low voltage RF, Plasma simulation
PDF Full Text Request
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