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Research Of TiAlCN Films Deposited Process By Arc Ion Plating On The Rings

Posted on:2015-11-13Degree:MasterType:Thesis
Country:ChinaCandidate:Z H ZhangFull Text:PDF
GTID:2181330431467220Subject:Materials Processing Engineering
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Ring is a main consumable of spinning machine, it has animportant influence on the yarn quality and cost. This paper achieves C,N, Al, Ti Quaternary plated under the condition of low temperature byvacuum arc ion plating technology. Low surface hardness, bad wearresistance and big friction coefficient of rings have been solved. Thispaper studies the impact of matrix hardness, surface roughness of thesubstrate, negative bias, arc current and the gas flow rate on the TiAlCNfilm properties. Through the analysis of experimental results, we canget to the following conclusions:(1) The TiAlCN films were prepared successfully at lowtemperature(less than180oC) on GCr15ring substrate by arc ion platingtechnology. The film/substrate adhesion exceeded30N. The filmthickness is2~2.2μm. The film hardness more than1700HV.(2) The substrate surface roughness is small, the film surface issmooth and the film/substrate adhesion is greater. When the surfaceroughness is0.01μm, the adhesion to42.8N. Higher substrate hardness,bigger film/substrate adhesion. When the substrate hardness is835HV,the adhesion to31.2N.(3) NaCl face centered cubic crystal structure with aluminumelement in the film did not change the TiN film. In the X-ray diffraction,TiN compared to AlN is preferentially formed, due to the AlN does notexist in the film. The AlN will reduce the mechanical properties offilms.(4) With the increase of the negative bias, TiN(111)2θ are36.840 °,36.823°and36.737°, TiN peak moves to the left as a whole, thelattice parameter, d(TiN)value increased, hardness, thickness, adhesionof the films and the number of particles increased first and thendecreased. In-50V, spherical particles is a little. The film surface hassome cracks. The number of particles is about200. In-100V, particleson the surface of film is smaller and uniform distribution, the number ofparticles is about680and the compact film was prepared. In-150V, thenumber of particles is about590, the particles size at-150V is similar to-100V particle size.(5) With the increase of arc current, the TiN peak moved to leftfirst and then to right, the unit cell parameters, hardness and adhesion ofthe films first increased and then decreased and appeared the distortionof crystal lattice, the number of particles has been increased. Somecrack exists at40A. The number of large particles on the film surface isclose to250, the particle size more than2μm is less, but the maximumparticle size reached10μm. When the arc current is increased to50A,the number of particles is about680, the particles of film surface aresmaller and the distribution is even. Arc current is increased to60A, thenumber of particles is about700, but particle size is smaller than themaximum size of50A particles many times.(6) The research of TiAlCxN1-xfilm with different C content(Different X values) shows: there are a lot of particles on the filmsurface. The particle size is less than2μm. The film thickness is about2μm. With the addition of C element in the film, the XRD spectra of(Ti0.5, Al0.5) N peaks are broadened. The average grain size of the filmsis10~30nm. With the increase of C2H2/(C2H2+N2) gas proportionincreased from0to0.75, the C content increased, the N contentdecreases. Ti and Al content in TiAlCxN1-xfilms is not changedobviously. The x value in the films increases from0to0.69(acetyleneflow rate increases from0sccm to150sccm), Ti: Al is about1:1.Without C(x=0), the film hardness is10.214GPa, the elastic modulus is188.996GPa and the adhesion is34N. When C content increased from0to0.18, the hardness and elastic modulus increased slightly slowly, adhesion is reduced to29N. When the x value increased from0.18to0.49, the hardness and elastic modulus increased dramatically, theadhesion force increased to33N. When the x value was0.49, thehardness and elastic modulus are reaching a maximum value of26.217GPa and467.205GPa. Continue increase the x value, hardnessand elastic modulus of the films decrease sharply, while the adhesionincreased to34N.Experiments show that the180o C or less to achieve alow-temperature coatingThe experiments realized low temperature coating at180℃. Thesurface hardness of ring more than1700HV, the ring has good wearresistance and the friction coefficient between0.1and0.3.
Keywords/Search Tags:Arc ion plating, Ring, TiAlCN, Adhesion, Frictioncoefficient
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