Font Size: a A A

The Design And Research On The Pulse Vacuum-arc

Posted on:2009-03-13Degree:MasterType:Thesis
Country:ChinaCandidate:Y J LuFull Text:PDF
GTID:2190360242472917Subject:Plasma physics
Abstract/Summary:PDF Full Text Request
Magnetic Filtered Vacuum Pulse Arc Plasma preparation of films is a new type fashion. In this paper, the controlling system and collecting system of installation which is used to prepare films with Pulse Vacuum-arc Plasma were discussed. Furthermore, some related narrate about the establishment and improvement of the vacuum chamber also been discussed. The power supply with high voltage pulses and high electric current, the design of the SCM that control the power's pulse periods, frequency, and the process of its produce have been studied specially. In addition, we made and improved the electrode, magnetic filtered curve and the structure of the vacuum chamber.In this paper, we emphasized on the research of the principle of PFNs and its parameter. Not only clarify the basic principle, but also introduced an "efFiciency-enchancing diode" which allows the LC circuit to do more "swing" after the arc pulse, thereby charging the capacitors to the correct polarity. The capacitors are therefore recharged much faster if the efficiency-enhancing diode is used, and the PFN can be operated at a much higher pluse repetition frequency without increasing the input power. Then, The value of the whole PFN was calculated by MATLAB simulation. Basing on this principle, we have devised an installation of high voltage pulses and high electric current power supply by ourselves.After the installation of high voltage pulses and high electric current power, we try to make a single pulse discharge and succeed. Then, the consecution of the discharge was tested. Eventually, we can control its time, cycle, frequency and other parameters according to the instruction which had been given advanced.In order to achieve the goal, we used the 8051 to control the trigger. We use the C to write the program. Via the program, it is convenience for us to amend and operate the trigger, which can provide a credible style to control the quality of the films and can help us to research the films.In order to collect the information of PFN and other circuits, we programmed the transmission and display kind by VC++, which can provide us collect the synchro signal of voltage and current which was triggered by SCM. And then transmit this information to the computer in series. All this can help us find out the relationship between the PFN and the films better.Furthermore, we designed a cathode vacuum arc electrode and two magnetic filtered curve ducts. One contains a 90°magnetic filter. The other is made up of two 90°magnetic filters. The former takes on comparatively high efficiency, the latter has a low efficiency though it can prepare films which are more compact and uniformity.The installation and improvement of the vacuum chamber is also a part of the paper. Contribute to the researches of books about vacuum, we not only made a linker which can get to a high vacuum degree, but also a heat-up facility with many function such as the control and measurements of temperature. Generally, it can heat up the vacuum chamber to 600 centigrade, which can help us understand how the high temperature effect on the Hollow Cathode Plasma and so on.Now, with the wide application of the industry of Cathode Arc Plasma, especially the emergence of the new superficial technology that prepares nano-nappe films and super-solid films by Cathode Arc Plasma, wiping off large particles and improving the transmission efficiency of Cathode Arc Plasma have been of great interest, thus it has been the hotspot. The complete set of the installation we designed could not only control stably the appearance of Cathode Arc and the thickness of deposit films, but also could filter the large impurity effectively and prepare high quality films. Therefore, this complete set of installation has a wide industrial perspective in the near future.Eventually, due to the reconstruct of the vacuum chamber by us, which make the vacuum chamber can meet the need of many kinds of discharge and different kind of the air pressure. We believe what we have done will play an important role on the research of the films.
Keywords/Search Tags:cathode arc, pulse, SCM, C
PDF Full Text Request
Related items