| The horniness films can be used at the making machine, automobile industry, spinning industry, geological drilling, dieing industry and aerospace engineering very comprehensive. In the actual industry, hardness is the most important technical requirement at the lots of datas. Besides this, the hardness at the high temperature, toughness, non-oxidizability and chemical stability are also very important. Peplo also have some requirements to hard material, such as friction factor, wear rate, adhesive strength and coefficient of heat conductivity. The different environment has the different emphases to the technical requirement of the thin-film material. Since 1985 Knotek published the research production about the coating, because of the good performance of TiAIN films that it has makes attention all the world. It is replacing TiN films. Peplo has paied for attentions to its service performance and has use some of PVD methods to make the TiAlN films.For use the PVD method to make the TiAIN and TiN/TiAlN films better and research its performance. In this paper, we use the AIP, HCD and AIP+HCD methods to make the TiN film, TiAIN film and TiN/TiAlN films. For researching the films we have found the processing parameter, specially to the component of the targets, making methods, cycle time and cleaning processing parameter. Use the multi-specimen test system to make the analytical study about the hardness, scratch marks, elastic ratio and adhesive power. Also use XRD, SEM, FE-SEM and CLSM to reaserch the pattern, structure and performance of the films.The focal point is to discuss and analysis the relationship between the structure, performance and processing parameter, especially the influence that be made by the different periods and targets. From observing the surface and sectional pattern about TiN/TiAlN films, it can be seen that at the same condition of the aggradation, the rate of the aggradation on the base stock, "55" target is better than "37" target. The samples are made by "55" target is very well. Its bulky grains are less, the surface is smooth, the pits are less and shallow and its mechanical property is better than "37" target. From XRD, the multi-films can be seen have the structure of TiN,AlFe3,AlN,Ti2AlN, explained the multilayer films formed the modulate sturcture favorable, crystal intergrality preferably. The multi-specimen test system test show that:the hardness of TiN/TiAlN multilayer films is tiptop to 40.12GPa, outclass the TiN films and TiAIN films. The hardness of films by 55 target is excel the 37 target in same condition. Scratch test show that:The critical load of the TiN/TiAlN multilayer films made by 55 target is excelled the films made by 37 target.The critical load of the TiN/TiAIN multilayer films made by 37 target is excelled the TiAIN monolayer films. The flexibility resume ability and hardness of the TiN/TiAIN multilayer films made by 55 target is excelled the films made by 37 target, and there are all excelled the TiAIN monolayer films.In this research, obtained the best parameter of how to made the multilayer films, confirm the best plating method of TiAIN and TiN/TiAlN films, and plating the TiAlN and TiN/TiAIN films in W6Mo5Cr4V2 surface successful. From the result, it can be seen that: use the AIP+HCD can made the favorable TiN/TiAIN films. The applycation of 55 target have a better foreground by AIP+HCD. |
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