Study On TiN/TiCrN/TiCrAIN Hard Multilayer Film Deposited By Multi-arc Ion Plating

Ti N hard film deposited on the high-speed steel tools can enhance their hardness and wear resistance, which, in turn, improve cutting performance and service life. However, the cutting tools covered with single nitride hard film can not fulfill the function requirements of the industrial development. On the other hand, the various composite techniques, namely film alloying, multilayer and gradient-layer, could improve the comprehensive quality and service life of the hard films. Therefore, the objective of this study is to achieve the better properties of multi element layer film by multilayered structure.In this study Ti N/Ti Cr N inter-layer was deposited on the W18Cr4 V high-speed steel substrate by multi-arc ion planting. The film’s morphology and adhesion strength under different bias voltages and deposition time was studied, Selecteing one inter-layer, whose structure was tighter and adhesion strength was higher, then Ti Cr A1 N film was deposited on this inter-layer. Adjusting working time of Al target by activating Al target intermittently. Finally, the Ti N/Ti Cr N/Ti Cr A1 N films structure and property was studied.The surface morpholpgy and cross-fracture of Ti N/Ti Cr N inter-layer and Ti N/Ti Cr N/Ti Cr Al N films were observed by SEM, part of samples’ surface and cross-fracture constituents were analysed by EDS; The hardness of Ti N/Ti Cr N/Ti Cr Al N films were tested by micro-hardness tester; Adhision strength of Ti N/Ti Cr N inter-layer and Ti N/Ti Cr N/Ti Cr Al N films were tested by scratch tester, the critical load were obtained, the process and mechanism of the films fail were discussed. The structure and property of the films influenced by the deposition parameter were analysed.The results show that, the hardness of Ti N/Ti Cr N/Ti Cr Al N hard multilayer films deposited by multi-arc ion planting can achieve to 3272 HV, the adhesion strength is 79.3N, and the structure of the film was tight. Moreover, this study show that, Ti N/Ti Cr N/Ti Cr Al N hard multilayer films can be deposited by Ti, Cr, Al pure metal targets, and have bright prospects in industry application.