Effect Of Bias Voltages And Nitrogen Partial Pressure On AlCrTiSiN/AlCrN Films Deposited By Arc Ion Plating

In this study, the Al Cr Ti Si N/Al Cr N films with various substrate bias voltage and nitrogen partial pressure were deposited on high speed steel and cemented carbide substrates by Arc ion plating(AIP) technique, and XRD, XPS, EDS, SEM, Nano-indentation and Scratch test were used to systematically investigate the effect of depositing parameters on composition, phase structure, crossing-section and surface morphology, hardness, adhesion strength and tribological property of the films.The results showed that the Al Cr Ti Si N/Al Cr N films were mainly comprised of(Al、Ti)N、(Al、Cr)N、Si3N4 and showed columnar growth perpendicular to the substrates. The density of macroparticles(MPs) on the surface of the Al Cr Ti Si N/Al Cr N films decreased by increasing bias voltages and nitrogen partial pressures. All the films possessed higher hardness which was over 30 GPa. The film deposited at-120 V、3Pa exhibited the maximum hardness of 35.36 GPa. The highest adhesion strength value of 67.25 N was obtained when the film was deposited at-80 V、2Pa. The better friction performance of the film was acquired when it deposited at-80 V of bias voltage and 3 Pa of nitrogen partial pressure.