Research On Molybdenum And Iridium Thin Films Deposited By Fused Wire Explosion Method

Due to the excellent high temperature strength, refractory metals are closely related to many fields that have special requirements to the high temperature strength of materials. As coating or film materials, molybdenum and iridium refractory metals are widely used in the fields of thin film solar cells and aeronautics and astronautics. The corresponding preparation technologies of molybdenum and iridium films have always been the hot topic in related fields. Fused wire explosion deposition is a kind of new preparation method for thin films, and is suitable for preparing refractory metal films. In this paper, we focused on the research of molybdenum and iridium films deposited by fused exploding wires, including the assembly of fused wire explosion deposition device, and the effect of exploding parameters on the thin film deposition process. On the basis of this, the analysis sample of molybdenum and iridium films were prepared, and the microstructure of molybdenum and iridium films were characterized; The effect of annealing on the iridium films microstructure was explored, The main conclusions are as follows:The self-assembly device of fused wire explosion deposition was able to prepare refractory metal films under the condition of vacuum. According to the analysis of high-speed camera photographs, we can see that the metal wire experienced a solid-liquid-gas-plasma process, and then exploded, migrated, deposited on the surface of the substrate. The utilization of electrical energy in wire explosion was affected by the charging voltage, circuit inductance and air pressure. The wire explosion was difficult to happen in the condition of high vacuum and large circuit inductance.The molybdenum films deposited by fused wire explosion had serious texture problems. The distance between target and substrate had a significant impact on the quality of the thin films. When the distance changed, the thickness, surface defect, roughness and hardness of the deposited molybdenum film films were different.The deposition efficiency of the fused wire explosion deposition for preparing iridium films was low. The roughness of the deposited film surface depended on the surface quality of the substrate. The iridium films deposited were petal shaped, with small density and hardness. After vacuum annealing, there was no iridium element in the XPS spectra of iridium films, in the XRD diffraction pattern, Niobium diffraction peaks shifted to the left, and a few small diffraction peaks were observed.