Study Of Thin Films Prepared By Reactive Dc Magnetron Sputtering In 3003 Aluminum Foil Surface

3003 aluminum foil has advanced corrosion resistance, electrical conductivity and thermal conductivity properties, and it is widely used in electronics and microelectronics industry, energy and information science fields. However, asymmetry of microstructure, dark surface and low rigidity in 3003 aluminum foil surface are difficult to control. There are mainly two solutions: refining the internal structure and modifying surface structure. In this paper, by DC reactive magnetron sputtering method, using stainless steel target, Ti target, ITO target and Mo target respectively, the thin films were prepared successfully, and the effects of the different targets and sputtering parameters on aluminum foil thin film surface microstructure and properties have been studied furtherly .The experiment results show that when using stainless steel target, the best sputtering power is 300W, substrates temperature at 320℃and time for 40 min. and the stainless steel thin film combined well with Al alloy foil substrates. The film has the satisfied surface qualities, such as brightness, anti-corrosive. Especially, the hardness and anti-wear properties have also been increased to some extent.The (Ti,Al)N films were deposited by DC magnetron sputtering with an independent Ti target on aluminium alloy substrates. The best power at 300W, substrates temperature at 280℃and time for 40 min, the (Ti,Al)N films have high brightness, high hardness, scratch resistance and anti-corrosive, etc. In this paper, the effects of nitrogen flow on the microstructure and mechanical properties of (Ti,Al)N films have also been studied. At N₂ flow rates at 7sccm, the (Ti,Al)N films have an optimum dense, isotropic, fine grain's microstructure with optimum scratch resistance and anti-corrosive. ITO thin films were successfully deposited by DC magnetron sputtering. The ITO thin films combined well with Al alloy foil substrates. The film prepared under the power at 210W, substrates temperature at 120℃and time for 20 min has the satisfied surface qualities, such as brightness, hardness, scratch resistance, anti-wear and anti-corrosive. The ITO thin films were crystallized and combined well with 3003 Al-substrate.AlMo₃, Al₃Mo thin films were successfully deposited by DC magnetron sputtering on Al alloy foil substrates. The AlMo₃ and Al₃Mo thin films were combined well with Al-base alloy, and the processing parameters can improve the qualities of the surface of Al alloy foil, such as increasing specific surface area, hardness and brightness, etc.