Electrochemical Performance Of Ti-ni Hydrogen Storage Films And Test System Design

MH-Ni battery has been the research focus in battery field. The study and development of hydrogen-storage materials as negative electrode have greatly effect on electrochemical characterization. The study of hydrogen-storage films is an important direction. Ti-Ni system electrode has good oxidation and pulverization resistance. In this article, the electrochemical characterization of Ti-Ni films were studied by electrochemical testing equipment designed.In this paper, the class and application and the MH-Ni battery's work principle of hydro gen-storage materials were introduced. The research results of different hydrogen-storage films and Ti-Ni system electrode were told. On this basis of study above, the works of this paper were determined.Electrochemical testing system was designed and three-electrode battery equipment and constant current power and the work process of the system were introduced in detail.Ti-Ni thin films were prepared by ion beam sputtering deposition technology. EDX, XRD and SEM determined the component, structure and plan-view image of the films. The films' electrochemical characterization of different component and structure were studied. The results indicated that when the substrate's temperature was room temperature, Ti-Ni thin films' structure prepared by ion beam sputtering deposition technology was amorphous. When the substrate's temperature was 350癈 or 450癈, the structure was crystal. Crystal thin films had better adherence than amorphous thin films. Ti-Ni thin films had better electrochemical activity. With increase of Ti, discharge capacity was increasing, but the decay of capacity became fast with the increase of cycle number. Crystal thin film had higher discharge capacity than amorphous thin films, but the capacity'sdecay was very fast for crystal thin films. Finally, the reasons of decrease of Ti-Ni thin films discharge capacity were discussed.