Effect Of Sputtering Parameters On The Magnetic Properties Of SmCo₅/Cu Films

In this information age, The development of information technology and theinformation industry requires hard magnetic recording disk has more capacity and highersurface density of the recording. With the magnetic recording density quickly increasing,the requirements about media structure and property have been proposed for magneticrecording thin films is more and more essential. As we know, the SmCo₅thin films has thehighest uniaxis-crystal anisotropy in all material as known now. The SmCo₅thin filmspossess high coercivity and small grain size of2.4nm, which makes SmCo₅as a suitablekind of high density magnetic recording media.SmCo₅film is an suitable candidate for the recording material of the future highdensity magnetic recording for its huge uniaxial magnetocrystalline anisotropy. In thispaper, SmCo₅films were fabricated by RF magnetron sputtering system onto quartz glasssubstrate, and a Cu underlayer was proposed in order to improve magnetic properties ofSmCo₅films. The dependences of sputtering power, thickness and annealing temperatureon the magnetic properties of the SmCo₅/Cu films were researched. Using the optimalsputtering parameters of sputtering power of60W, thickness of65nm and annealingtemperature of650℃, the coercivity of SmCo₅/Cu films is improved significantly from557Oe to1150Oe.