Font Size: a A A

Deposition And Characterization Of TiAlN/Ag/TiAlN Low-E Film

Posted on:2013-07-03Degree:MasterType:Thesis
Country:ChinaCandidate:M WuFull Text:PDF
GTID:2231330362473976Subject:Materials science
Abstract/Summary:PDF Full Text Request
Low-E glass can reflect infrared and ultraviolet, while having high transmittance ofvisible light, which is widely used in construction and automobile manufacturing. Inorder to improve the heat insulation performance and visible light transmittance ofLow-e glass, in this work, TiAlN/Ag/TiAlN Low-E coatings were prepared byRF-magnetron sputtering on glass. The effect of deposition parameters on the opticalperformance of TiAlN/Ag/TiAlN Low-E films were investigated by ultraviolet-visiblespectrophotometer. All samples were characterized by probe surface profiler, Fouriertransform spectrometer, X-ray diffraction, scanning electron microscopy,X-rayphotoelectron spectroscopy, and other equipments.The main results are as follows:Firstiy, the relation of TiAlN film’s optical characterization and depositionparameters has been discussed, also did the crystalline structure and morphology ofTiAlN thin film. When the Ti sputtering power was50W, the Al sputtering power was100W, the nitrogen flow rate was30sccm and the sputtering time was90min in theexperiment, the visible transmittance of TiAlN thin film could reach up to89.5%at thewavelength of550nm and the emissivity was0.74.Secondly, TiAlN(28nm)film’ chemical composition and microstructure was testedby SEM, XRD and XPS. It’s found that the film was formed by Ti, Al and N, of whichwas composed by amorphous AlN and Ti3AlN.Thirdly, the TiAlN/Ag/TiAlN Low-E costing was prepared. When insider and outerTiAlN film’s Ti sputtering power was50W, Al sputtering power was100W, nitrogenflow rate was30sccm, sputtering time was90min and Ag film’s sputtering power was120W, sputtering time was30s, the transmittance of TiAlN/Ag/TiAlN Low-E costingreached up to87%at the wavelength of550nm, and the emissivity was0.14, whichsurpasses in the present national standard.Forth, the effect of TiAlN/Ag/TiAlN Low-E costing’s deposition parameters to itscorrosion-resistance was investigated. It’s found that TiAlN(28nm)/Ag(12nm)/TiAlN(28nm) Low-E costing presents good H2S-resistance and NaCl-resistance. Thevariation of Low-E film’s visible transmittance was less than4%, in line with nationalstandard.
Keywords/Search Tags:Low-emissivty, TiAlN, RF-magnetron sputtering, Chemical-durability
PDF Full Text Request
Related items