Preparation And Properties Of TiAlN And TiAlSiN Films By Magnetron Sputtering Method

With the development needs of the modern tools,the dibasic tin films can not meet the needs of the industry. Contemporary tool surface treatment are required to the development of multiple and composite coating.Contrasted to tin film,tialn and tialsin multiple film have better hardness,better oxidation resistance and better wear resistance,thus has better research and practical value.In this paper,tialn and tialsin film were the use of ti-al and ti-al-si alloy target on stainless steel,carbide substrate,by changing the N2 partial pressure and temperature and sputtering power with magnetron sputtering technique.Films phase composition,microstructure and composition were characterized by scanning electron microscopy(SEM),spectrum analyzer(EDS) and X-ray diffraction(XRD) films. Films hardness,dimensional morphology and adhesion were characterized by hardness tester, laser confocal, automatic scratch tester.And the influence of N2 partial pressure,deposition temperature and sputtering power on phase structure,microscopic surface morphology, mechanical properties.Studies have shown that:(1) Introduction of Al atoms can significantly improve the hardness of films. When Ti,Al atomic ratio is 50:50,70:30, the maximum hardness of film is similar and this hardness is about 3700hv. The maximum hardness of tialn film which is deposited by the target of 20% Al. After adding Si atoms, tialsin film hardness increased 4300hv, and si atoms caused the intensity of the peak shift and broadened and moved.(2) Oxidation resistance temperature of tialn films is about 800℃, while tialsin oxidation resistance temperature is up to 900℃ under optimum process parameters. It shows that Al, Si atoms added to films can significantly improve the oxidation resistance of the film.(3) When the film has the maximum hardness, the tialn film binding force is 25N, if we choose stainless steel substrate; If we choose carbide alloy substrate, the tialn film binding force is about 80N, while tialsin film binding force is about 69N.(4) TiAIN film has better corrosion resistance when atomic ratio of 70:30 target, N2 partial pressure is 0.08Pa and sputtering power is 800w and sputtering temperature is 300℃.(5) TiAlSiN XRD analysis showed that the film has not generate a new phase when Si atoms are added, but serve to make the peak width and the peak of the movement effect.(6) When the Al content in the target is 50%, the film has the lowest friction coefficient about 0.45. The tialni film has the lower coefficient friction than TiAIN film, and the friction coefficient of tialsin is about 0.35.