Study On Preparation And Properties Of Multi-multilayer Films

In this paper, it describes the principle, characteristics, application and developmentstatus quo of the multi-arc ion plating technique, and then reviewes the thin films of TiN, CrN,TiCrN.Using XH800multi-arc ion plating equipment which is self-made to preparing TiN, CrNand TiN/TiCrN/CrN multi-multilayer film(15layers) on YG6carbide surface.The structure,morphology, composition, and the main performance of films were examined by XRD、SEM、Micro-hardness Test,Stereo microscope and Scratch Test.The XRD patterns indicates that the TiN film to the TiN (111) crystal plane preferredorientation, and existence of the TiC phase. In CrN film, it contains CrN and Cr2N phase, andno elemental Cr phase. The TiN/TiCrN/CrN multi-multilayer films exists TiN and Cr2N phase,with the chromium target current increaseing, the preferred orientation of TiN from (200)changes into (111), and also appeares elemental Cr.The SEM of microscopic observation showed that the surface of TiN/TiCrN/CrNmulti-multilayer films have less large particles than the monolayer, the introduction of Crimproved the surface quality of the film. The fracture morphology shows the TiN/TiCrN/CrNmulti-multilayer films have the multi-layer structure, and it changes the coarse columnar graingrowth of the monolayer, makes the film a fine columnar grain growth. The thickest of TiN/TiCrN/CrN multi-multilayer film is5.02μm, the thickness of film are affected by the targetcurrent, deposition time, bias factors and so on. Both monolayer and multilayer film whichare dense structure, as well as have a good combination with the matrix.Surface spectroscopy results show that the monolayer surface N:Ti and N:Cr atomicpercentage is close to1:1, the presence of droplets and particles are the main causes ofdeviation, which relative with targets current and bias; the TiN/TiCrN/CrN multi-multilayerfilm surface composition which related with titanium target and chromium target current ratio,the number of droplets and particles of the film surface impacted by the chromium targetcurrent.Microhardness and binding test show that the hardness of the TiN monolayer is about2000HV, the highest is2156HV, the binding force is up to50N; the hardness of CrNmonolayer is up to2595N and the binding force reach to60N. The hardness of theTiN/TiCrN/CrN multi-multilayer films is2000HV above, which highest is up to2336HV, thehighest binding force is63N. The hardness of TiN/TiCrN/CrN multi-multilayer films isbetween TiN film and CrN film.Compared to the TiN film, it have a little elevation.thebinding force is stonger than the monolayer’s, because of the emergence of multi-layerstructure which makes the grain refinement reduce the internal stress in the film.Both microhardness and adhesion are influenced by the bias voltage, target current and soon.Appropriatly, increasing bias and reducing the target current contribute to hardness andbinding capacity to improve. Select the appropriate bias voltage and target current is anecessary condition for quality TiN/TiCrN/CrN multi-multilayer films were prepared...