The Simulation And Optimization Of Rectangular Magnetron Sputtering Target

Magnetron sputtering has been developed as one of the most important technologies in industrial of coating. Rectangular target have a bright future because of production of large area coating applied more widely.Magnetic field distribution makes important role in the process of magnetron sputtering. The strength and distribution of magnetic field determine the characteristics of the plasma, which affect the quality of film, etched area and the utilization of target. Obviously, theoretical researches and optimization in this field will have important academic and practical values.On the basis of existing K07-087-type coating production line produced in SKY Technology Development Co., in order to solve the problem of uneven distribution of magnetic field on target surface, we simulated the magnetic field distribution with ANSYS finite element software, and measured the distribution of magnetic field on target surface with using Gauss meter, to verify the correctness of the model.We systemically analyzed the influences of target structure parameters on the magnetic field, including uniformity and intensity. The structure parameters including the distance between the target material and iron, the height of magnet, the width and height of inner magnet and outer magnet, the length and height of shunted piece.Optimize target structure parameters of rectangular target cross-section in K07-087-type coating production line using ANSYS APDL language. Followed by the APDL optimizing, the magnetic field distribution become more uniform, and the level of magnetic induction intensity also improved. In order to further increase the breadth of uniformity distribution region, we assembled shunted pieces on the back of the copper back board of the target. Finally, the horizontal magnetic induction intensity of sputtering regional central reduced about6.9%, accorded the ideal magnetic field distribution condition.Based on VB platform to build a user interface to calls ANSYS directly, that is rectangular magnetron targets parameters and optimal design interface. By using parameter dialog window, we can enter the required parameters, and then generate relevant APDL statement, finally the process using ANSYS automatically, achieving parametric and optimization, outputting the result automatically.