Testing Research On The Ion Energy And Current Density Of The Plasma In Magnetron Sputtering Film Process

The magnetron sputtering coating technology is widely used in various industries like machinery, chemistry, energy source, environment, medicine, etc. With the extensive application and the instant development of the magnetron sputtering coating technology, people ask higher qualifications for its rationality and accuracy. To grasp the magnetron sputtering coating technology process requires making carefully diagnosis and analysis study on the plasma in it. Analyze the influence of the magnetron sputtering coating process parameters on the plasma and the effect of the change of the plasma on the film deposition on the plasma bridge, in order to optimize the film deposition process by means of plasma diagnostics.This paper mainly researches the change of the ion energy and current density inside the direct-current magnetron sputtering coating machine based on the contact plasma diagnostics.This paper presents the extensive application of the low temperature plasma technology, the research situation of the plasma diagnostic technique and the influencing factors of the film deposition during the course of the magnetron sputtering coating process. The limitations of the Faraday probe in the measurement of the ion energy and current density are summarized by the study on the measurement principle of the Faraday probe. The Faraday ion energy and current density analyzer is designed through the theoretic calculation and the structural analysis.Under the conditions of the0.2Pa-0.4Pa working pressure and the30W-150W direct-current discharge power, the negative bias voltage of the Faraday ion energy and current density analyzer should be at-48V is confirmed via experiment. At the time of the current density measurement, the positive bias voltage loaded on the grid is at10V.On the one hand, the changing situation of the ion energy and current density under the certain technological parameters above-mentioned is measured by the Faraday ion energy and current density analyzer. On the other hand, the film deposition rate under the same circumstance is surveyed by the FTM-V film thickness monitoring gauge. Ultimately, through the comparison and analysis of the experimental data, the influence of the working pressure and the discharge power on the film deposition is expounded from the point of the ion energy and current density.