Studies On Performance Of PET Film And Application In Photoresist Dry Film

PET film with excellent physical and chemical properties, in the industrial materialoccupies an important position, widely used in electronics, electrical appliances,magnetic recording, photographic film, ray tablet, packaging and printing, and otherindustrial fields. Resist dry film is used for lithography technique the photosensitivematerial, lithography technique is integrated circuit and vlsi circuit manufacturing akind of one of the most important methods. PET film for light resistance layer of thecarrier, shield, mainly from oxygen, stratified and avoid mechanical scratch. PET filmin exposure after developing before eliminate, prevent exposure oxygen to resist layerdiffusion, cause sensitivity down. Therefore, the performance of PET film for dry filmproduction play an important role.Secondly based on PET film in light resistance dry film production processoccurred in the process of tension bad, owe point problems such as too much, is studiedand analyzed, and through the production test analysis the following conclusion:in lightresistance dry film production, the tension bad PET film, the use of90n expansiontension can overcome the PET film tension to bad now, dry film coating influence; Atthe same time, with low viscosity light resistance dry film product model coating, PETfilm tension bad influence will be more low. for PET film bubble problems, using lowline speed can reduce owe point rate, light resistance dry film quality better.Lightresistance dry film with PET film don’t fit do corona or bottom coating surfacetreatment.Through the light resistance dry film production process parameters optimization,reduce the PET film defects on the influence of the dry film production, to improve dryfilm product quality goals for enterprise to save the cost and has the good economicefficiency.