Sculpture Film Plating System And Its Features

As the film is more and more widely used, the performance and functionality of the film has been required.The film technology is also deepening With the emergence of these requirements. Due to its micro-controllable, the sculptured film has a broad application prospects.This paper begins with presenting the ordinary film growth theory, and then analyse the microstructure of the film, we analyze the microstructure of the sculptured film and which cause these characteristics by illustrating the sculptured thin film growth which differs from conventional film.We analogize the sculptured film to optical crystal materials.According to the particularity of the sculptured film, equivalent index model that is suitable for the sculptured film has been built. We also derive a formula suitable for calculating the monolayer sculpture film optical constants. Respectively, we deposit TiO2and SiO2films at the deposite angle of65°,70°,75°,80°,85°.The differences of the refractive index and thickness of these films that are caused by different parameters of the process has been obtained by spectral analysis. Then we use Ellipsometer to analysis the anisotropy of the sculptured film, and characteristic the microscopic structure of the sculpture film by building a appropriate model. Using the Ellipsometry to test the equivalent refractive index model that has been built. Then analysis the results, point out the inadequacies of the result of the Subject experiment and make an outlook on the sculptured film’s future.