Study On Photoresist Coating Of Curved Surface

Photetch is make use of photochemistry reaction that photoresist contact with light.Then by chemistry or physics of etch,the pitrue of marking transfer into substrate.In process of photetch,photoresit coating is a very important technology.In the paper,for coating photoresist on large of curve surface,make use of the method of combine academic analyse and experiment to study on feasibility of coated photoresist on large of optical element of convex curve surface.In base of analyse mechanism of spray coating,and combine with characteristic of convex sphere to establish a mathematic model of flim of thick.Then in base of mathematic model,design a set of ultrasonic atomization of machinery for photoresist coating of convex surface.Make use of the device to spray coating5μm film on a100mm caliber and120mm radius of convex surface.The thick and average of coated film is satisfy demand.And analyse mainly factors what affect photoresist of thick.The result has shown that if other parameters is invariable, dispensed volume has a critical value.When dispensed volume within the range,mathematic model is effectiv e.Contrarily,mathematic model is ineffective.When time of dispense is over critical va ule,increasing interfere from environment.Ultimately,the thick of film is departure from ture value.And solid content of solution is determine by the thick of photoresist and viscosity.