Fabrication Of Fluorinated Graphene And Characterization Of Fluorinated Graphene/Graphene Heterostructure | Posted on:2017-03-27 | Degree:Master | Type:Thesis | Country:China | Candidate:W Lu | Full Text:PDF | GTID:2271330488491019 | Subject:Electronic Science and Technology | Abstract/Summary: | PDF Full Text Request | Study on covalently functionalization of graphene with different plasma treatment condition was carried out. SLG was synthesized by chemical vapor deposition (CVD) technique. With SF6 choosing as the source gases, the effects on the resulted functionalized graphene were systematically addressed using Raman, XPS and electrical characterization. Fabrication and potential applications of fluorinated graphene(FG)/graphene(G) heterojunction were also discussed.Monolayer and multilayer graphene was grown by CVD. Single layer graphene was transferred to SiO2 by wet transfer and bubble transfer, but multilayer graphene was cleaner when transferred by modified RCA wet method.Fluorinated graphene was successfully fluorinated by SF6 plasma as reported in literature. The plasma condition parameters (plasma power and reaction time) were controlled to get the best parameters. The fluorination rate saturated when F:C atomic ratio was 15%and sheet resistance was more than 50 MQ/□.High quality FG could be prepared by lower plasma power and more reaction time.Fabrication of horizontal and vertical fluorinated graphere/graphene heterojunction was discussed. We also demonstrated the performance enhancement effect of FG/Gr heterojunction on photo-detector, the responsivity of this structure can reach 103 A/W. In addition, we researched the influence of fluorination power, a characteristic saturation of the photocurrent was observed. | Keywords/Search Tags: | graphene, transfer, fluorinated graphene, heterojunction, photo-detector | PDF Full Text Request | Related items |
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