| MgO film has many excellent properties such as good chemical stability and thermal stability. It has the similar lattice constant compared with ferroelectric materials which have perovskite structure at room temperature. It’s very suitable to be buffer layer between some functional oxide thin films and semiconductor substrate so as to relieve the lattice mismatch effectively and prevent the diffusion. MgO film has been widely used in the field of micro-electronic components.Ultrasonic spray pyrolysis has been applied to deposit MgO films with mgnesium nitrate solution as the precursor material on quartz plate substrate. The crystalline structure and microstructure of Mg O films were verified by X-ray diffraction(XRD), scanning electron microscope(SEM) and ultraviolet–visible spectroscopy(UV-VIS). The paper researched on the influence of substrate temperature on MgO film crystalline structure, surface morphology and optical properties, and explored effects of annealing treatment on the crystalline structure and morphology of the MgO film.The results indicate that with the increase of substrate temperature within 650 ℃, the crystallization behavior of MgO film becomes better, the grain size becomes large and the surface becomes more compact and smooth. The size of MgO grain varies greatly and the density of the film decreases when the substrate temperature is too high. As the substrate temperature increases, light transmittance of MgO films will be increased. Therefore, the substrate temperature has a significant influence on the crystal structure, surface morphology and optical properties of MgO film, and it is an effective means to control MgO film structure and optical properties. After annealing treatment, the grain size of the MgO film become significantly larger, in the same time, MgO grains become rounded and more compact. Obviously, annealing treatment can optimize the MgO film crystalline structure and surface morphology effectively. |
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