Error Compensation And Accuracy Evaluation Of Nano-CMM

In order to make the Nano-CMM achieving high-precis ion measurement of the three-dimensional feature size, the main research activities described in this article are as follows:1. Improve the MDFMS of Nano-CMM Co-planar XY stage. By effective combination of the Michelson interferometer, wavelength compensation and auto power circuit such that the MDFMS displacement measurement resolution can be reach 1 nm, the wavelength stability better than 10"6, in 20 mm of each point in the stroke positioning error is less than ± 20 nm, multiple measurement standard deviation is less than 15 nm, which can be achieve a high-precision displacement measurement; Autocollimator module can effectively measure pitch/yaw angle which exist during the measurement,the resolution of Autocollimator module can be reach 0.1 arcsec, within ±100 arcsec measurement range the error cannot exceed ±0.5 arcsec, so we can compensate the Abbe error which has the significant influence of the measuring machine.2. MDFMS, Linear Diffraction Grating Interferometer, and three-dimensional displacement sensor within the probe has been corrected by conparing with the SIOS laser interferometer, Renishaw laser interferometer so that the measurement precision of sensors has been effectively guaranteed;3. The volumetric error of Nano-CMM major contains positioning errors, angular errors, straightness errors, perpendicularity errors, Abbe error, straightness errors of mirrors and optical path difference caused by mirror deflection, these errors can be derived and calibrated to effectively reduce the volumetric error of Nano-CMM.4. By using the high precision constant temperature box and vibration isolation platform, effectively reduce the influence of environment on nanoscale measurement, and after the error compensation of the CMM combining with the three-dimensional nano-contact scanning probe, to achieve high-precision measurement for the surface of the lens, the optical flat and the gauge block.