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Design And Implementation Of Mueller Matrix Ellipsometry Platform

Posted on:2016-08-26Degree:MasterType:Thesis
Country:ChinaCandidate:J ChenFull Text:PDF
GTID:2311330479452654Subject:Mechanical and electrical engineering
Abstract/Summary:PDF Full Text Request
In the application area of nanotechnology research and nano manufacturing, research on nano-structure metrology method becomes more and more important. Nanostructure metrology, requires to measure the three dimensional topography of nanostructures quickly and accurately, but also needs minimize the damage and pollution to the tested sample. Since the traditional methods of nano-structure metrology can not satisfy the requirements above simultaneously, supported by Major Scientific Instruments and Equipment Development Projects of China, this thesis studies the design and implementation of measurement test platform based on the Muller Matrix ellipsometry. The main efforts include:The optical path design of a dual rotating-compensator Muller matrix ellipsometer completed. The key components are selected based on analysis and comparison. The thesis mainly introduce the design of the test platform, combined with optical patch design and the corresponding optical element selection, the polarizing optical path and detecting path are integrated on an optical platform, based on which the control unit of the measurement test platform is constructed and debugged.Synchronous motion control scheme design and implementation are completed.By collecting zero position signal of the two rotating compensator motor, when two motors are in synchronous state, synchronization signal acquisition card sends a signal to the external trigger of the spectrometer, and therefore the measurement data acquisition is completed synchronously.After the construction of the optical measurement test platform hardware and control unit, based on the software of measurement analysis developed using Matlab, we carry out the integration of the entire test platform and performance test. At first, using the air medium as the measuring object, and the performance of the corresponding key element is evaluated. Then, measurement test on the standard sample with known nano-structure is carried out. Possible factors influencing on the measurement accuracy are further eliminated by data analysis, in order to improve the accuracy and reliability of the measurement test platform.
Keywords/Search Tags:Nano-structure, dual rotating-compensator, Optical structure design, Muller matrix elliptic partial measurements, Synchronous motion control
PDF Full Text Request
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